◆ Our popular
Short Course is focused on Cleaning Chemistries for New Materials.
Taught by Dr. Srini Raghavan, Professor of Materials Science and Engineering,
University of Arizona
最受欢迎的教育短训课程，今年主题是：关于新材料的化学清洗原理。该课程将由亚利桑那大学( University of Arizona)材料科学与工程教授Srini Raghavan博士讲授。 ◆ An overview on FSI’s New Single Wafer Cleaning
Cluster
关于FSI新推出的单晶圆清洗技术产品组合的介绍
◆ Technical Presentations by FSI and IC Manufacturers on Industry Drivers, Challenges and Solutions
来自FSI和产业先驱的IC制造商将对行业的挑战和解决方案发表技术演讲
·All Wet Photoresist Removal
·Metal Stripping for Salicide Formation
·Particle Removal with Cryogenic aerosol
·Cleaning of Cu/Low-K Dual Damascene |
